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Characteristics of the plasmonic nanostructure. (a) Schematic structure. (b) SEM image of gold grating without covered polycrystalline LiNbO3 layer. (c) AFM image of a 120-nm thick LiNbO3 film. (d) AFM image of a 25-nm thick gold film.
Measured (a) and calculated (b) linear transmission spectrum for TM polarization case. Arrow indicates the position of the probe laser. Dotted curve is for the reference sample. Dashed vertical line indicates the position of the waveguide mode calculated using wavevector match condition. Measured results (c) and calculated (d) linear transmission spectrum for TE polarization case. (e) Measured linear transmission spectrum of a 25-nm thick gold film embedded in a 120-nm thick polycrystalline LiNbO3 layer.
Measured (a) and calculated (b) extinction spectrum for TM polarization case. Dotted curve is for the reference sample. Calculated electric-field distribution for a 580-nm (c), 600-nm (d), and 700-nm (e) incident light. Measured (f) and calculated (g) extinction spectrum for TE polarization case. (h) Calculated electric-field distribution for a 610-nm incident light.
All-optical tunability of plasmonic-induced transparency. (a) Measured transmission changes of a 600-nm probe light as a function of the time delay between the pump and probe pulses. The thick line represents the exponentially fitted result. (b) Calculated transmission spectrum of the gold/polycrystalline LiNbO3 plasmonic nanostructure with different pump intensities.
(a) Linear absorption spectrum of a 120-nm thick polycrystalline LiNbO3 film. (b) OKE signal of a 120-nm thick polycrystalline LiNbO3 filmand a 170-μm thick SiO2 film. PLN represents polycrystalline LiNbO3. (c) Calculated extinction spectrum of gold grating embedded in background material with a refractive index equal to that of polycrystalline LiNbO3.
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