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Plasma doping and reduced crystalline damage for conformally doped fin field effect transistors
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10.1063/1.4809755
/content/aip/journal/apl/102/22/10.1063/1.4809755
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/22/10.1063/1.4809755
/content/aip/journal/apl/102/22/10.1063/1.4809755
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/content/aip/journal/apl/102/22/10.1063/1.4809755
2013-06-05
2014-10-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma doping and reduced crystalline damage for conformally doped fin field effect transistors
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/22/10.1063/1.4809755
10.1063/1.4809755
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