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Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers
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10.1063/1.4811269
/content/aip/journal/apl/102/24/10.1063/1.4811269
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/24/10.1063/1.4811269
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Composition ratio of nitrogen to Ta plotted against the N sputter gas concentration (Q). The dashed lines indicate the stable TaN compounds (Ref. ): from bottom, Ta, TaN, TaN, TaN, TaN, TaN, and TaN. Inset: Q dependence of the single film resistivity ρ. (b) Magnetic moment per unit area (M/A) as a function of the CoFeB layer nominal thickness for SiO|1 Ta| CoFeB|2 MgO|1 Ta measured at room temperature (circles). Linear fit to the data is shown by the solid line; the dashed line indicates a linear fit for thick (t > 2.2 nm) CoFeB films. Squares show M/A measured at 10 K. (c,d) Variation of (c) magnetic dead layer thickness (t) and (d) average saturation magnetization ( ) with Q for the as deposited (red circles) and 300 °C annealed (black squares) films. The dashed and dotted lines in (d) represent reported M values of CoFe and CoFeB, respectively (Ref. ).

Image of FIG. 2.
FIG. 2.

(a) Magnetic moment per unit volume (M/V) and (b) magnetic anisotropy (K) plotted as a function of the underlayer thickness d for SiO|d underlayer|1 CoFeB|2 MgO|1 Ta. The underlayer is Ta (black squares), TaN(Q=1%) (red circles) and TaN(Q=9%) (blue triangles). K is estimated using the nominal CoFeB thickness (the dead layer thickness is not subtracted).

Image of FIG. 3.
FIG. 3.

Product of the effective anisotropy ( ) and the effective thickness t = t-t plotted as a function of t. is estimated using t for the CoFeB thickness. The solid line shows a linear fit to the data for an appropriate data range. (b) Interface magnetic anisotropy (K), (c) slope of vs. t, and (d) bulk contribution to the PMA (K) as a function of the N gas concentration (Q) during the underlayer deposition for the as deposited (red circles) and 300 °C annealed (black squares) films. The error bars in (b) correspond to the minimum and maximum values of K when the fitting range is varied within the linear part of vs. t; see supplementary material for the details (Ref. ). The standard errors are smaller than the the symbol sizes. The error bars in (c, d) show the corresponding changes in the slope and K when the fitting range is varied.

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/content/aip/journal/apl/102/24/10.1063/1.4811269
2013-06-18
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced interface perpendicular magnetic anisotropy in Ta|CoFeB|MgO using nitrogen doped Ta underlayers
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/24/10.1063/1.4811269
10.1063/1.4811269
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