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Reduced threading dislocation densities in high-T/N-rich grown InN films by plasma-assisted molecular beam epitaxy
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10.1063/1.4789983
/content/aip/journal/apl/102/5/10.1063/1.4789983
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/5/10.1063/1.4789983
/content/aip/journal/apl/102/5/10.1063/1.4789983
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/content/aip/journal/apl/102/5/10.1063/1.4789983
2013-02-07
2014-11-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduced threading dislocation densities in high-T/N-rich grown InN films by plasma-assisted molecular beam epitaxy
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/5/10.1063/1.4789983
10.1063/1.4789983
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