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A trilayer architecture for polymer photoconductors
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/content/aip/journal/apl/102/5/10.1063/1.4791595
2013-02-07
2014-10-20

Abstract

A trilayer architecture is designed for polymer photoconductors. In such a structure, photogenerated electrons in poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid ethyl ester (P3HT:PCBM) blend film will flow into a TiOx layer beneath and then diffuse into a underlying PCBM layer. Photogenerated holes and electrons are thus efficiently separated by the spacer TiOx, and, respectively, transport in P3HT and PCBM films, carrier recombination is thereby greatly suppressed. As a result, photocurrent of the PCBM/TiOx/P3HT:PCBM trilayer structure increases more than 200 times over that of the conventional P3HT:PCBM single layer device.

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Scitation: A trilayer architecture for polymer photoconductors
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/5/10.1063/1.4791595
10.1063/1.4791595
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