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(a) A schematic diagram of the experiment system. FG: function generator; RF-PA: radio-frequency power amplifier; MNW: matching network; HIFU: high intensity focused ultrasound; IR: infrared. (b) A schematic diagram showing the time sequence of the entire system.
Normalized 2D temperature distribution acquired right after the 0.1 s HIFU exposure when the temperature temporally reaches the peak value with HIFU exposure power equal to (a) 6.1, (b) 12.85, and (c) 16.64 W. Both the two dotted lines in (c) pass through the maximum temperature and are used to plot the lateral and axial temperature profiles. A similar way was adopted for (a) and (b) to plot the profiles.
Measured (a) lateral and (b) axial FWHMs as a function of the HIFU exposure power.
Measured (a) lateral and (b) axial FWHMs as a function of the HIFU exposure time.
Lateral and axial FWHMs calculated from the simulated data as a function of (a) HIFU exposure power and (b) HIFU exposure time.
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