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Hydrogen plasma microlithography of graphene supported on a Si/SiO2 substrate
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10.1063/1.4793197
/content/aip/journal/apl/102/7/10.1063/1.4793197
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/7/10.1063/1.4793197
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Figures

Image of FIG. 1.
FIG. 1.

(a) Typical Raman spectra of covered (black) and plasma treated (red) parts of graphene supported on Si/SiO2. (b) Optical microscope image of the silicon stencil maskused for plasma microlithography. (c)20 × 20 μm2 (80 × 80 pixels) Raman microscopy of patterned graphene, showing a clear increase of the D peak to G peak intensity ratio at the plasma treated areas.

Image of FIG. 2.
FIG. 2.

10 × 10 μm2 (a) topography and (b) CPD images of the pristine graphene layer supported on a Si/SiO2 substrate, measured in a dry nitrogen atmosphere.

Image of FIG. 3.
FIG. 3.

10 × 10 μm2 (a) topography and (b) CPD images of CVD grown graphene patterned with hydrogen plasma microlithography. Darker CPD contrasts are the plasma exposed areas. (c) CPD profile of the A-A′ line in (b). The histogram of (b) is shown in (d), in which the three Gaussian peaks correspond to 3 different contrasts of the CPD image. The difference between peaks (i) and (iii) which correspond to the dark and bright areas is 60 ± 20 meV. Peak (ii) is due to the averaging effects and corresponds to the areas in between dark and bright areas.

Image of FIG. 4.
FIG. 4.

(a) CPD image of patterned graphene after annealing at in UHV. Potential diagram of graphene supported on clean Si/SiO2 before (b) and after (c) hydrogen plasma treatment. Wgr denotes the work function of a free standing graphene. is the potential drop across the graphene SiO2 interface. Ev and Ef are the vacuum level and the Fermi level, respectively. is the energy loss to the surface charge density of graphene created as a result of electrostatic charging at equilibrium distance d with respect to the substrate subscripts i and f denote the pristine and hydrogen plasma treated graphene, respectively.

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/content/aip/journal/apl/102/7/10.1063/1.4793197
2013-02-19
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrogen plasma microlithography of graphene supported on a Si/SiO2 substrate
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/7/10.1063/1.4793197
10.1063/1.4793197
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