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Representative AFM (left panels) and MFM (right panels) images for untemplated [(a) and (b)] and templated [(c) and (d)] cobalt electrodeposits. The height scale for the AFM images [(a) and (c)] covers 400 nm, with white corresponding to the tallest features. The MFM images [(b) and (d)] cover a phase range of 4°. Each image covers an area of 10 μm × 10 μm. Panel (a) also includes a height cross section, taken at the position of the black horizontal line, with a total height scale of 250 nm.
(a) Uniform cobalt films: Comparison of experimental and simulated in-plane and perpendicular MH loops at low temperatures. (b) In-plane uniform film experimental and simulated (half-loop) results at 300 K for different R. The simulation with lowest R most closely matched the experimental results (black triangles).
Simulated results for coercivity vs. log sweep rate for uniform films at 300 K. In-plane coercivity at Log(R) = 4 Oe/ns has the average value of 1500 Oe (off scale).
(a) Patterned cobalt films: Simulated results for patterned films at zero temperature and experimental loops at 100 K. (b) Comparison of experimental uniform and patterned cobalt films at 100 K. Perpendicular loops were normalized to the maximum M value, obtained at 18 kOe.
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