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Unveiling the mechanisms of dressed-photon–phonon etching based on hierarchical surface roughness measure
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10.1063/1.4793233
/content/aip/journal/apl/102/7/10.1063/1.4793233
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/7/10.1063/1.4793233
/content/aip/journal/apl/102/7/10.1063/1.4793233
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/content/aip/journal/apl/102/7/10.1063/1.4793233
2013-02-20
2014-07-11
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Unveiling the mechanisms of dressed-photon–phonon etching based on hierarchical surface roughness measure
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/7/10.1063/1.4793233
10.1063/1.4793233
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