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Formation of triplet and quadruplet plasmonic nanoarray templates by holographic lithography
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View: Figures


Image of FIG. 1.
FIG. 1.

(a) Side-view of the beam geometry of the four-beam interference lithography system; (b) corresponding difference wave vectors in reciprocal space; (c) and (d) contour plots of the resulting interference pattern with different initial phase shifts of δ1 = 0° and δ2 = 180°. The green outline highlights the iso-intensity minima that are used to generate the pattern in the negative tone photoresist.

Image of FIG. 2.
FIG. 2.

(a)-(d) A selection of possible triplet motive shapes achieved by varying one (a, b), two (c), or three (d) polarization angles. Green outlines highlight iso-intensity minima in (a, b) which would create dot-pattern in negative-tone photoresist. Yellow outlines in (c, d) highlight the iso-intensity maxima that would create hole-patterns. White triangles indicate the unit cell of periodicity.

Image of FIG. 3.
FIG. 3.

(a) Quasi-quadruplet and (b) quadruplet motive shape achieved by varying two and three polarization angles, respectively. The white squares are used to indicate the unit cell of the periodicity.

Image of FIG. 4.
FIG. 4.

SEM images of plasmonic templates with the following symmetries: (a) simple hexagonal lattice, (b) twin motive, (c) triplet motive by varying polarization in one beam, (d) triplet motive by varying polarization of two beams, and (e) quasi-quadruplet. (f) and (g) demonstrate down forming into gold nanoparticle arrays. All scale bars are 1 μm. Blue arrows indicate the position and number of the nanogaps within the unit cell. Yellow arrows point out the relative gap orientation with angles indicated. Note that the polarization direction of the surface plasmon field would be orthogonal to the yellow arrows.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation of triplet and quadruplet plasmonic nanoarray templates by holographic lithography