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Nanopatterning of diarylethene films via selective dissolution of one photoisomer
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1.
1. X. Xie, Y. Liu, M. Zhang, J. Zhou, and K. S. Wong, Physica E 44, 11091126 (2012).
http://dx.doi.org/10.1016/j.physe.2011.12.020
2.
2. J. Leroy, A. Crunteanu, A. Bessaudou, F. Cosset, C. Champeaux, and J. C. Orlianges, Appl. Phys. Lett. 100, 213507 (2012).
http://dx.doi.org/10.1063/1.4721520
3.
3. D. W. Carr, L. Sekaric, and H. G. Craighead, J. Vac. Sci. Technol. B 16, 3821 (1998).
http://dx.doi.org/10.1116/1.590416
4.
4. O. Wilhelmi, S. Reyntjens, C. Mitterbauer, L. Roussel, D. J. Stokes, and D. H. W. Hubert, Jpn. J. Appl. Phys. 47(6), 50105014 (2008).
http://dx.doi.org/10.1143/JJAP.47.5010
5.
5. N. Brimall, T. L. Andrew, R. V. Manthena, and R. Menon, Phys. Rev. Lett. 107, 205501 (2011).
http://dx.doi.org/10.1103/PhysRevLett.107.205501
6.
6. P. Cantu, T. L. Andrew, R. Castagna, C. Bertarelli, and R. Menon, Appl. Phys. Lett. 100, 183103 (2012).
http://dx.doi.org/10.1063/1.4710547
7.
7. E. Abbé, Arch. Mikrosk. Anat. Entwichlungsmech. 9, 413 (1873).
http://dx.doi.org/10.1007/BF02956173
8.
8. L. Li, R. R. Gattass, E. Gershgoren, H. Hwang, and J. T. Fourkas, Science 324(5929), 910913 (2009).
http://dx.doi.org/10.1126/science.1168996
9.
9. L. Li and J. T. Fourkas, Mater. Today 10(6), 30 (2007).
http://dx.doi.org/10.1016/S1369-7021(07)70130-X
10.
10. T. L. Andrew, H. Y. Tsai, and R. Menon, Science 324(5929), 917921 (2009).
http://dx.doi.org/10.1126/science.1167704
11.
11. S. C. Laza, M. Polo, A. A. R. Neves, R. Cingolani, A. Camposeo, and D. Pisignano, Adv. Mater. 24, 13041308 (2012).
http://dx.doi.org/10.1002/adma.201103357
12.
12. H.-Y. Tsai, S. W. Thomas III, and R. Menon, Opt. Express 18(15), 16015 (2010).
http://dx.doi.org/10.1364/OE.18.016014
13.
13. S. W. Hell, Science 316, 1153 (2007).
http://dx.doi.org/10.1126/science.1137395
14.
14. S. W. Hell, Phys. Lett. A 326, 140 (2004).
http://dx.doi.org/10.1016/j.physleta.2004.03.082
15.
15. M. Switkes and M. Rothschild, J. Vac. Sci. Technol. B 19, 2353 (2001).
http://dx.doi.org/10.1116/1.1412895
16.
16. Y. Kim, T. J. Hellmuth, D. Sysoiev, F. Pauly, T. Pietsch, J. Wolf, A. Erbe, T. Huhn, U. Groth, U. E. Steiner et al., Nano Lett. 12, 37363742 (2012).
http://dx.doi.org/10.1021/nl3015523
17.
17.See supplementary material at http://dx.doi.org/10.1063/1.4826925 for the modeling method, fabrication techniques, and dissolution characterization. [Supplementary Material]
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/content/aip/journal/apl/103/17/10.1063/1.4826925
2013-10-24
2014-11-24

Abstract

The ability to pattern nanometric features on various substrates with high throughput, accuracy, and uniformity is the key driving force enabling novel applications in nanophotonics, nanoelectronics, nano-electro-mechanical systems, and nanofluidics. Patterning via Optical Saturable Transitions (POST) is an optical nanopatterning technique that circumvents the far-field diffraction limit by exploiting the linear switching properties of thermally stable photochromic molecules. Previously, POST was enabled by an electrochemical oxidation “locking step.” In this letter, we report an electrode-free “locking step” that exploits the difference in solubility between the two isomeric states of a photochromic molecule in a polar solvent. The reported method obviates the need for a conducting underlayer and also reduces the number of required steps. Using this method, we demonstrated isolated lines of width ∼λ/4 and spacing between features as small as ∼λ/2.5 for an exposure wavelength of λ.

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Scitation: Nanopatterning of diarylethene films via selective dissolution of one photoisomer
http://aip.metastore.ingenta.com/content/aip/journal/apl/103/17/10.1063/1.4826925
10.1063/1.4826925
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