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Temperature-dependence of the Hall coefficient of NdNiO3 thin films
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10.1063/1.4828557
/content/aip/journal/apl/103/18/10.1063/1.4828557
http://aip.metastore.ingenta.com/content/aip/journal/apl/103/18/10.1063/1.4828557
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) On-axis XRD around the 002 reflection of a 16.5 nm NdNiO film grown on (001) LaAlO. (b) Off-axis XRD of the same film at a tilt angle of Ψ = 45°, showing 011 reflections of film and substrate. The double peak of the LaAlO substrate is due to twinning. (c) Cross-section HAADF-STEM image. (d) Longitudinal resistivity of a 16.5 nm film as a function of temperature measured upon cooling and heating, respectively.

Image of FIG. 2.
FIG. 2.

(a) Time-dependence of the longitudinal resistance at different temperatures around . Shown is the percentage change from the value measured 5 min after the temperature has stabilized, upon cooling from room temperature (filled symbols) and heating from 10 K (open symbols), respectively. (b) Amount of drift, as defined in (a), after 5 h, as a function of temperature under cooling (blue filled circles) and heating (orange open triangles), respectively. (c) Raw data (dashed lines) as a function a magnetic field measured over 6 h of continuous field sweeps from −9 to 9 T at  = 80 K. Also shown is the drift-corrected (solid line).

Image of FIG. 3.
FIG. 3.

(a) Longitudinal resistivity and drift-corrected as a function of temperature. (b) Same as (a) but within a narrower range of temperatures to show the positive in the metallic region. (c) Seebeck coefficient as a function of temperature in the metallic phase. Measurements upon cooling (heating) are shown as circles (triangles).

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/content/aip/journal/apl/103/18/10.1063/1.4828557
2013-10-31
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Temperature-dependence of the Hall coefficient of NdNiO3 thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/103/18/10.1063/1.4828557
10.1063/1.4828557
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