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Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
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10.1063/1.4837335
/content/aip/journal/apl/103/22/10.1063/1.4837335
http://aip.metastore.ingenta.com/content/aip/journal/apl/103/22/10.1063/1.4837335
/content/aip/journal/apl/103/22/10.1063/1.4837335
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/content/aip/journal/apl/103/22/10.1063/1.4837335
2013-11-27
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/103/22/10.1063/1.4837335
10.1063/1.4837335
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