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In situ laser annealing during growth of Pb(Zr0.52Ti0.48)O3 thin films
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10.1063/1.4816157
/content/aip/journal/apl/103/3/10.1063/1.4816157
http://aip.metastore.ingenta.com/content/aip/journal/apl/103/3/10.1063/1.4816157

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the laser annealing setup.

Image of FIG. 2.
FIG. 2.

XRD patterns of annealed PZT 52/48 on laser crystallized 20/80 seed.

Image of FIG. 3.
FIG. 3.

(a) Surface FE-SEM of the laser annealed PZT (52/48) film on laser crystallized (20/80) seed and (b) the corresponding fracture cross-sectional FE-SEM.

Image of FIG. 4.
FIG. 4.

(a) XRD of the annealed PZT (52/48) on (111) sol-gel (30/70) seed layer. (b) and (c) are the corresponding surface and cross-sectional FE-SEM of the same film.

Image of FIG. 5.
FIG. 5.

(a) XRD of the annealed PZT (52/48) on a (100) SrTiO single crystal. Cross-sectional (b) and surface (c) FE-SEM of the same film.

Image of FIG. 6.
FIG. 6.

(a) Dielectric properties of the laser annealed PZT (52/48) film on laser crystallized PZT (20/80) seed layer.

Tables

Generic image for table
Table I.

Dielectric properties of PZT (52/48) films prepared by the laser annealing technique on various seed layers.

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/content/aip/journal/apl/103/3/10.1063/1.4816157
2013-07-19
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ laser annealing during growth of Pb(Zr0.52Ti0.48)O3 thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/103/3/10.1063/1.4816157
10.1063/1.4816157
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