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(a) Schematic representation of the Au/SiO2/Si MIS waveguide and (b) normalized electric field intensity distribution of the fundamental TM mode with a predicted propagation length of 21.9 μm at 1.55 μm.
Scanning electron microscope images of fabricated 200 nm wide linear Au/SiO2/Si MIS waveguides after (a) liftoff to define the plasmonic features and (b) etching to define the underlying photonic elements. (c) Power transmitted through waveguides with lengths up to 20 μm at λ = 1.55 μm. (d) Broadband propagation loss.
(a) Schematic representation of the Au/SiO2/Si MIS Bragg reflector. (b) Top-down schematic of the distributed Bragg reflector resonator depicting taper dimensions (a 1, a 2, a 3, m 1, m 2, and m 3), mirror dimensions (w 1 and w 2), and central cavity (L). (c) Scanning electron microscope image of a representative device, device 2, after liftoff. Normalized electric field intensity distributions of device 2 at the Au/SiO2 interface (d) “off” (λ = 1.51 μm) and (e) “on” (λ = 1.53 μm) resonance (dimensions not shown to scale to improve visibility).
Experimental broadband transmission (blue solid line) for several devices with 5 nanosegment mirrors and 3 nanosegment tapers as compared to experimentally normalized FDTD simulations (red dashed line) for (a) device 1 with cavity length L = 510 nm and nanosegment length w 1 = 210 nm separated by w 2 = 150 nm, (b) device 2 with cavity length L = 510 nm and nanosegment length w 1 = 250 nm separated by w 2 = 100 nm, (c) device 3 with cavity length L = 675 nm and nanosegment length w 1 = 250 nm separated by w 2 = 100 nm, and (d) device 4 with cavity length L = 510 nm and nanosegment length w 1 = 300 nm separated by w 2 = 45 nm. The central peaks of the FDTD simulations of devices 1, 2, and 4 are fitted with a Lorentzian (green dotted line) in order to accurately calculate the Q factor.
Distributed Bragg reflector resonator cavity, mirror and taper dimensions.
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