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Scaled ZrO2 dielectrics for In0.53Ga0.47As gate stacks with low interface trap densities
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10.1063/1.4875977
/content/aip/journal/apl/104/18/10.1063/1.4875977
http://aip.metastore.ingenta.com/content/aip/journal/apl/104/18/10.1063/1.4875977
/content/aip/journal/apl/104/18/10.1063/1.4875977
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/content/aip/journal/apl/104/18/10.1063/1.4875977
2014-05-09
2015-07-06
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Scaled ZrO2 dielectrics for In0.53Ga0.47As gate stacks with low interface trap densities
http://aip.metastore.ingenta.com/content/aip/journal/apl/104/18/10.1063/1.4875977
10.1063/1.4875977
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