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1.
1. R. Lanz and P. Muralt, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 52, 936 (2005).
http://dx.doi.org/10.1109/TUFFC.2005.1504014
2.
2. M. Hara, T. Yokoyama, T. Sakashita, S. Taniguchi, M. Iwaki, T. Nishihara, M. Ueda, and Y. Satoh, Jpn. J. Appl. Phys., Part 1 49, 07HD13 (2010).
3.
3. T. Nishihara, T. Yokoyama, T. Miyashita, and Y. Satoh, in Proc. IEEE Ultrason. Symp. ( IEEE, 2002), p. 969.
http://dx.doi.org/10.1109/ULTSYM.2002.1193557
4.
4. T. Yanagitani, K. Arakawa, K. Kano, A. Teshigahara, and M. Akiyama, in Proc. IEEE Ultrason. Symp. ( IEEE, 2010), p. 2095.
http://dx.doi.org/10.1109/ULTSYM.2010.5935791
5.
5. M. Moreira, J. Bjurstrom, I. Katardjev, and V. Yantchev, Vacuum 86, 23 (2011).
http://dx.doi.org/10.1016/j.vacuum.2011.03.026
6.
6. R. Matloub, A. Artieda, C. Sandu, E. Milyutin, and P. Muralt, Appl. Phys. Lett. 99, 092903 (2011).
http://dx.doi.org/10.1063/1.3629773
7.
7. A. Alsaad and A. Ahmad, Eur. Phys. J. B 54, 151 (2006).
http://dx.doi.org/10.1140/epjb/e2006-00438-8
8.
8. M. Akiyama, T. Kamohara, K. Kano, A. Teshigahara, Y. Takeuchi, and N. Kawahara, Adv. Mater. 21, 593 (2008).
http://dx.doi.org/10.1002/adma.200802611
9.
9. T. Yanagitani and M. Suzuki, Appl. Phys. Lett. 104, 082911 (2014).
http://dx.doi.org/10.1063/1.4866969
10.
10. M. Suzuki, T. Yanagitani, and H. Odagawa, Appl. Phys. Lett. 104, 172905 (2014).
http://dx.doi.org/10.1063/1.4874840
11.
11. K. Hashimoto, S. Sato, A. Teshigahara, T. Nakahara, and K. Kano, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 60, 637 (2013).
http://dx.doi.org/10.1109/TUFFC.2013.2606
12.
12. F. Tasnadi, B. Alling, C. Hoglund, G. Wingqvist, J. Brich, L. Hultman, and I. A. Abrikosov, Phys. Rev. Lett. 104, 137601 (2010).
http://dx.doi.org/10.1103/PhysRevLett.104.137601
13.
13. G. Wingqvist, F. Tasnadi, A. Zukauskaite, J. Birch, H. Arwin, and L. Hultman, Appl. Phys. Lett. 97, 112902 (2010).
http://dx.doi.org/10.1063/1.3489939
14.
14. S. Fujii, S. Shimizu, M. Sumisaka, Y. Suzuki, S. Otomo, T. Omori, and K-Y. Hashimoto, Proc. IEEE Freq. Control Symp. ( IEEE, 2014), p. 350.
http://dx.doi.org/10.1109/FCS.2014.6859938
15.
15. J. D. Larson, D. K. Winslow, and L. T. Zitelli, IEEE Trans. Sonics Ultrason. 19, 18 (1972).
http://dx.doi.org/10.1109/T-SU.1972.29637
16.
16. T. Yanagitani and M. Kiuchi, J. Appl. Phys. 102, 044115 (2007).
http://dx.doi.org/10.1063/1.2772589
17.
17. Y. Ohashi, M. Arakawa, J. Kushibiki, B. M. Epelbaum, and A. Winnacker, Appl. Phys. Express 1, 077004 (2008).
http://dx.doi.org/10.1143/APEX.1.077004
18.
18. S. Zhang, W. Y. Fu, D. Holec, C. J. Humphreys, and M. A. Moram, J. Appl. Phys. 114, 243516 (2013).
http://dx.doi.org/10.1063/1.4848036
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/content/aip/journal/apl/105/12/10.1063/1.4896262
2014-09-26
2016-12-09

Abstract

The electromechanical coupling, elastic properties, and temperature coefficient of elastic constant of Sc Al N films with high Sc concentration (x) of 0–0.70 were experimentally investigated. Near the phase boundary, a Sc Al N film exhibited a maximum thickness extensional mode electromechanical coupling coefficient 2 of 12% (  = 0.35), which is almost double the value of 6.4% for typical pure AlN films. In the region of 0 < x < 0.2, the electromechanical coupling was confirmed to increase without any detectable deterioration in the temperature stability of (=−54.5 ppm/ °C). This region is favorable in terms of temperature stability and is suitable for wideband resonator filter applications.

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/deliver/fulltext/aip/journal/apl/105/12/1.4896262.html;jsessionid=8SDEbAtGFJEgXX_mGpr8pib1.x-aip-live-02?itemId=/content/aip/journal/apl/105/12/10.1063/1.4896262&mimeType=html&fmt=ahah&containerItemId=content/aip/journal/apl
true
true

Access Key

  • FFree Content
  • OAOpen Access Content
  • SSubscribed Content
  • TFree Trial Content
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
/content/realmedia?fmt=ahah&adPositionList=
&advertTargetUrl=//oascentral.aip.org/RealMedia/ads/&sitePageValue=apl.aip.org/105/12/10.1063/1.4896262&pageURL=http://scitation.aip.org/content/aip/journal/apl/105/12/10.1063/1.4896262'
x100,x101,x102,x103,
Position1,Position2,Position3,
Right1,Right2,Right3,