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Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for next generation plasmonic devices
6. R. Alaee, C. Menzel, U. Huebner, E. Pshenay-Severin, S. B. Hasan, T. Pertsch, C. Rockstuhl, and F. Lederer, Nano Lett. 13, 3482 (2013).
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A double-patterning process for scalable, efficient, and deterministic nanoring array fabrication is presented. It enables gaps and features below a size of 20 nm. A writing time of 3 min/cm2 makes this process extremely appealing for scientific and industrial applications. Numerical simulations are in agreement with experimentally measured optical spectra. Therefore, a platform and a design tool for upcoming next generation plasmonic devices like hybrid plasmonic quantum systems are delivered.
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