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/content/aip/journal/apl/105/23/10.1063/1.4903243
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/content/aip/journal/apl/105/23/10.1063/1.4903243
2014-12-10
2016-12-10

Abstract

Nonvolatile memory devices based on CuInS (CIS) quantum dots (QDs) embedded in a polymethylmethacrylate (PMMA) layer were fabricated using spin-coating method. The memory window widths of the capacitance-voltage (C-V) curves for the Al/CIS QDs embedded in PMMA layer/p-Si devices were 0.3, 0.6, and 1.0 V for sweep voltages of ±3, ±5, and ±7 V, respectively. Capacitance-cycle data demonstrated that the charge-trapping capability of the devices with an ON/OFF ratio value of 2.81 × 10−10 was maintained for 8 × 103 cycles without significant degradation and that the extrapolation of the ON/OFF ratio value to 1 × 106 cycles converged to 2.40 × 10−10, indicative of the good stability of the devices. The memory mechanisms for the devices are described on the basis of the C-V curves and the energy-band diagrams.

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