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/content/aip/journal/apl/106/2/10.1063/1.4906111
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/content/aip/journal/apl/106/2/10.1063/1.4906111
2015-01-14
2016-09-26

Abstract

We show that the -type conductivity of the narrow band gap In(AsN) alloy can be increased within a thin (∼100 nm) channel below the surface by the controlled incorporation of H-atoms. This channel has a large electron sheet density of ∼1018 m−2 and a high electron mobility ( > 0.1 m2V−1s−1 at low and room temperature). For a fixed dose of impinging H-atoms, its width decreases with the increase in concentration of N-atoms that act as H-traps thus forming N-H donor complexes near the surface.

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