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/content/aip/journal/apl/108/4/10.1063/1.4940974
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/content/aip/journal/apl/108/4/10.1063/1.4940974
2016-01-26
2016-12-08

Abstract

Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature , each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.

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