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/content/aip/journal/apl/109/11/10.1063/1.4962815
2016-09-16
2016-09-27

Abstract

Vanadium dioxide is a promising material for THz modulations due to its remarkable insulator-to-metal transition (IMT) properties. Silicon-doped VO films, exhibiting excellent IMT properties with giant modulation amplitude and tunable phase transition temperature, greatly adapt in this area. In this paper, we report on a rebound effect of the IMT in Si-doped VO films. As the silicon dopants are increasingly introduced into VO films, the IMT is first tuned to lower temperature and then is anomalously shifted to higher temperature. This rebound effect is confirmed by crystal structure, valence concentration, and surface morphology. We attribute this rebound behavior to the interstitial and substitutive doping of Si atoms. Due to their distinct impactions on the crystallite, IMT properties of the VO films are depressed initially and recovered later.

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