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Photolocking‐A new technique for fabricating optical waveguide circuits
1.S. E. Miller, IEEE J. Quant. Electron. QE‐8, 199 (1972);
1.P. K. Tien, Appl. Opt. 10, 2395 (1971).
2.R. Ulrich and H. P. Weber, Appl. Opt. 11, 428 (1972).
3.General background information on the photochemical reactions can be found in D. C. Neckers, Mechanistic Organic Photochemistry (Reinhold, New York, 1967).
4.For these experiments the arc was equipped with water and Pyrex filters to eliminate ir and hard uv light. When focused so as to illuminate the entire slide, the near‐uv flux was about with most of this in the lines at 365 and 313 nm (approximately 3:2 intensity ratio). Exposure times were typically 10–30 min., or a total exposure of 6–18
5.P. K. Tien, R. Ulrich, and R. J. Martin, Appl. Phys. Lett. 14, 291 (1969).
6.H. P. Weber, F. A. Dunn, and W. N. Leibolt, Appl. Opt. 12, 755 (1973).
7.E. A. J. Marcatili, Bell Syst. Tech. J. 48, 2103 (1969).
8.E. A. J. Marcatili, Bell Syst. Tech. J. 48, 2071 (1969).
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