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Quantum interference effects in high‐transition‐temperature thin‐film materials
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4.The pair density can be altered by a local modification of any material parameter upon which it depends. Some techniques to achieve this modification involve: the natural thickness dependence in some thin films, proximity effect in layered films, ion implantation, diffusion, chemical, thermal or radiation damage, etc. The dimensional precision required has been achieved from photoresist or electron beam techniques and film thickness modification has been done by anodization, and ion, plasma, or chemical etch.
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6.We wish to express our appreciation to Professor T. Ohtsuka, Tohoku University; and Professor R. Hammond and Professor W. A. Little, Stanford University for providing the films used in these experiments without which this work would not have been possible.
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