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Influence of implanted dose on the recrystallization of Si amorphous layer
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10.1063/1.88123
/content/aip/journal/apl/26/4/10.1063/1.88123
http://aip.metastore.ingenta.com/content/aip/journal/apl/26/4/10.1063/1.88123
/content/aip/journal/apl/26/4/10.1063/1.88123
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/content/aip/journal/apl/26/4/10.1063/1.88123
2008-09-02
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of implanted dose on the recrystallization of Si amorphous layer
http://aip.metastore.ingenta.com/content/aip/journal/apl/26/4/10.1063/1.88123
10.1063/1.88123
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