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High‐efficiency multiply pulsed copper vapor laser utilizing copper chloride as a lasant
1.C. J. Chen, N. M. Nerheim, and G. R. Russell, Appl. Phys. Lett. 23, 514 (1973).
2.I. Liberman, R. V. Babcock, C. S. Lin, T. V. George, and L. A. Weaver, Appl. Phys. Lett. 25, 334 (1974).
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