No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Comment on ’’Evidence for electronic stopping in ion implantation: Shallower profile of lighter isotope 10B in Si’’
1.Y. Ohmura and K. Koike, Appl. Phys. Lett. 26, 221 (1975).
2.J. Lindhard, M. Scharff, and H. E. Schio/tt, Mat. Fys. Medd. Dan. Vid. Selsk. 33, 1 (1963).
3.W. C. Johnson and P. T. Panousis, IEEE Trans. Electron. Devices ED‐18, 965 (1971).
4.D. P. Kennedy, P. C. Murley, and W. Kleinfelder, IBM J. Res. Develop. 12, 399 (1968).
5.D. P. Kennedy and R. R. O’Brien, IBM J. Res. Develop. 13, 212 (1969).
6.C. P. Wu, E. C. Douglas, and C. W. Mueller, IEEE Trans. Electron. Devices ED‐22, 319 (1975).
Article metrics loading...
Full text loading...
Most read this month