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Implantation profiles of low‐energy helium in niobium and the blistering mechanism
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10.1063/1.88427
/content/aip/journal/apl/27/4/10.1063/1.88427
http://aip.metastore.ingenta.com/content/aip/journal/apl/27/4/10.1063/1.88427
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/content/aip/journal/apl/27/4/10.1063/1.88427
2008-09-02
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Implantation profiles of low‐energy helium in niobium and the blistering mechanism
http://aip.metastore.ingenta.com/content/aip/journal/apl/27/4/10.1063/1.88427
10.1063/1.88427
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