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Disorder produced by high‐dose implantation in Si
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10.1063/1.88886
/content/aip/journal/apl/29/10/10.1063/1.88886
http://aip.metastore.ingenta.com/content/aip/journal/apl/29/10/10.1063/1.88886
/content/aip/journal/apl/29/10/10.1063/1.88886
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/content/aip/journal/apl/29/10/10.1063/1.88886
2008-08-28
2015-06-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Disorder produced by high‐dose implantation in Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/29/10/10.1063/1.88886
10.1063/1.88886
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