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Oxygen effects on arsenic diffusion in silicon dioxide
1.K. Tsukamoto, Y. Akasaka, and K. Horie, Jpn. J. Appl. Phys. 16, 663 (1977).
2.A. S. Grove, Physics and Technology of Semiconductor Devices (Wiley, New York, 1967), Chap. 2.
3.J. F. Gibbons, W. S. Johnson, and S. W. Mylroie; Projected Range Statistics, 2nd ed. (Dowden, Hutchinson & Ross, Stroudsburg, Pa. 1975).
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