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Formation and quenching of XeF* in Ne/Xe/F2 mixtures
1.L. F. Champagne and N. W. Harris, Appl. Phys. Lett. 31, 513 (1977).
2.J. A. Mangano, J. Hsia, and A. M. Hawryluk (unpublished).
3.M. Rokni, J. H. Jacob, and J. A. Mangano (unpublished).
4.M. Rokni, J. H. Jacob, J. A. Mangano, and R. Brochu, Appl. Phys. Lett. 30, 458 (1977).
5.H. C. Brashears, Jr., D. W. Setser, and D. DesMarteau, Chem. Phys. Lett. 48, 84 (1977).
6.M. Rokni, J. H. Jacob, and J. A. Mangano, Phys. Rev. A 16, 2216 (1977).
7.T. H. Dunning, Jr., and P. J. Hay (unpublished).
8.Measurements by D. K. Bohme, N. G. Adams, M. Moselman, D. B. Dunkin, and E. E. Ferguson [J. Chem. Phys. 52, 5094 (1970)] show that the rate constant for and is very slow So it is reasonable to expect that charge transfer from to will not be dominant in e‐beam pumped XeF laser mixtures.
9.The fact that does predissociate is corroborated by the observation of strong emission of in mixtures as reported by J. K. Rice, A. K. Hays, and J. R. Woodworth [Appl. Phys. Lett. 31, 31 (1977)].
10.D. W. Setser (private communication).
11.J. A. R. Samson and F. L. Kelly, G. C. A. Tech. Rept. No. 69‐3‐N, 1964 (unpublished).
12.M. Krauss (private communication).
12.See also C. Y. Ng, P. W. Teideman, B. H. Mahan, and Y. T. Lee, J. Chem. Phys. 66, 5737 (1977).
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