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Compensation of mobile‐ion movement in SiO2 by ion implantation
1.R. J. Kriegler, Appl. Phys. Lett. 20, 449 (1972).
2.G. J. Derlerck, T. Hattori, J. Beaudoium, and J. D. Meindl, J. Electrochem. Soc. 122, 436 (1975).
3.A. J. Learn and D. W. Hess, J. Appl. Phys. 48, 308 (1977).
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