Full text loading...
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Compensation of mobile‐ion movement in SiO2 by ion implantation
1.R. J. Kriegler, Appl. Phys. Lett. 20, 449 (1972).
2.G. J. Derlerck, T. Hattori, J. Beaudoium, and J. D. Meindl, J. Electrochem. Soc. 122, 436 (1975).
3.A. J. Learn and D. W. Hess, J. Appl. Phys. 48, 308 (1977).
Article metrics loading...