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Erratum: Fabrication of deep square wave structures with micron dimensions by reactive sputter etching
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/content/aip/journal/apl/33/4/10.1063/1.90555
2008-08-08
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Erratum: Fabrication of deep square wave structures with micron dimensions by reactive sputter etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/33/4/10.1063/1.90555
10.1063/1.90555
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