Full text loading...
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
An oblique shadow deposition technique for altering the profile of grating relief patterns on surfaces
1.L. F. Johnson, G. W. Kammlott, and K. A. Ingersoll, Appl. Opt. 17, 1165 (1978).
2.Gratings in photoresist with a period and groove depths were obtained by exposure to interfering beams from a He‐Cd laser.
3.The argon ion‐beam milling rates at 2 kV, ion‐beam current, and 45° angle of incidence were measured to be 255, 170, 60, 55, and 60 Å/min, respectively, for GaAs, AZ‐1350, YAG, Ti, and Ta.
4.H. Abe, Y. Sonabe, and T. Euomoto, Jpn. J. Appl. Phys. 12, 154 (1973).
5.P. D. Davidse, J. Electrochem. Soc. 116, 100 (1969).
6.A. H. Heinecke, Solid‐State Electron. 19, 1039 (1976).
7.N. Hosokawa, R. Matsuzaki, and T. Asamaki, Jpn. J. Appl. Phys. Suppl. 2, Part 1, 435 (1974).
8.H. W. Lehmann and R. Widmer, Appl. Phys. Lett. 32, 163 (1978).
9.D. C. Flanders, H. I. Smith, H. W. Lehmann, R. Widmer, and D. C. Shaver, Appl. Phys. Lett. 32, 112 (1978).
10.D. C. Miller, J. Electron. Mater. 1, 499 (1972).
11.Although Ta and Ti are both soluble in HF, we have experienced difficulty in removing Ta residue after argon‐ion‐beam milling. No such problem exists for Ti.
12.M. Hatzakis, J. Electrochem. Soc. 116, 1033 (1969).
13.H. I. Smith, F. J. Bachner, and N. Efremow, J. Electrochem. Soc. 118, 821 (1971).
14.W. J. Choyke, W. D. Partlow, E. P. Supertzi, F. J. Venskytis, and G. B. Brandt, Appl. Opt. 16, 2013 (1977).
Article metrics loading...