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Niobium silicide formation induced by Ar‐ion bombardment
1.P. T. Stroud, Thin Solid Films 2, 1 (1972).
2.D. H. Lee, R. R. Hart, and O. J. Marsh, in Ion Implantation in Semiconductors, edited by I. Ruge and J. Graul (Springer, Berlin, 1971), p. 262.
3.D. H. Lee, R. R. Hart, D. A. Kiewit, and O. J. Marsh, Phys. Status, Solidi A 15, 645 (1973).
4.W. F. van der Weg, D. Siguid, and J. W. Mayer, in Applications of Ion Beams to Metals, edited by S. T. Picraux, E. P. Eernisse, and F. L. Vook (Plenum, New York, 1974), p. 209.
5.B. Y. Tsaur, Z. L. Lian, and J. W. Mayer, Appl. Phys. Lett. 34, 168 (1979).
6.K. N. Tu and J. W. Mayer, in Thin Films: Interdiffusion and Reactions, edited by J. M. Poate, J. W. Mayer, and K. N. Tu (Wiley, New York, 1978).
7.S. Matteson, J. Roth, and M.‐A. Nicolet, International Conference on Ion Beam Modification of Materials, Budapest, 1978, p. G7.
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