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Magnetic field control of reactive plasma etching
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10.1063/1.91136
/content/aip/journal/apl/35/5/10.1063/1.91136
http://aip.metastore.ingenta.com/content/aip/journal/apl/35/5/10.1063/1.91136
/content/aip/journal/apl/35/5/10.1063/1.91136
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/content/aip/journal/apl/35/5/10.1063/1.91136
2008-08-07
2014-08-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Magnetic field control of reactive plasma etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/35/5/10.1063/1.91136
10.1063/1.91136
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