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Short‐channel MOS FET’s fabricated by self‐aligned ion implantation and laser annealing
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10.1063/1.91229
/content/aip/journal/apl/35/8/10.1063/1.91229
http://aip.metastore.ingenta.com/content/aip/journal/apl/35/8/10.1063/1.91229
/content/aip/journal/apl/35/8/10.1063/1.91229
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/content/aip/journal/apl/35/8/10.1063/1.91229
2008-08-07
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Short‐channel MOS FET’s fabricated by self‐aligned ion implantation and laser annealing
http://aip.metastore.ingenta.com/content/aip/journal/apl/35/8/10.1063/1.91229
10.1063/1.91229
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