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Primary defects in low‐fluence ion‐implanted silicon
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10.1063/1.91311
/content/aip/journal/apl/36/1/10.1063/1.91311
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/1/10.1063/1.91311
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/content/aip/journal/apl/36/1/10.1063/1.91311
2008-07-23
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Primary defects in low‐fluence ion‐implanted silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/1/10.1063/1.91311
10.1063/1.91311
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