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Reduction of oxides on silicon by heating in a gallium molecular beam at 800 °Ca)
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10.1063/1.91428
/content/aip/journal/apl/36/3/10.1063/1.91428
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/3/10.1063/1.91428
/content/aip/journal/apl/36/3/10.1063/1.91428
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/content/aip/journal/apl/36/3/10.1063/1.91428
2008-07-23
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduction of oxides on silicon by heating in a gallium molecular beam at 800 °Ca)
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/3/10.1063/1.91428
10.1063/1.91428
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