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Application of laser annealing techniques to increase channel mobility in silicon on sapphire transistors
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10.1063/1.91432
/content/aip/journal/apl/36/3/10.1063/1.91432
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/3/10.1063/1.91432
/content/aip/journal/apl/36/3/10.1063/1.91432
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/content/aip/journal/apl/36/3/10.1063/1.91432
2008-07-23
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Application of laser annealing techniques to increase channel mobility in silicon on sapphire transistors
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/3/10.1063/1.91432
10.1063/1.91432
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