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Selective etching of Si relative to SiO2 without undercutting by CBrF3 plasma
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10.1063/1.91651
/content/aip/journal/apl/36/9/10.1063/1.91651
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/9/10.1063/1.91651
/content/aip/journal/apl/36/9/10.1063/1.91651
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/content/aip/journal/apl/36/9/10.1063/1.91651
2008-07-23
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective etching of Si relative to SiO2 without undercutting by CBrF3 plasma
http://aip.metastore.ingenta.com/content/aip/journal/apl/36/9/10.1063/1.91651
10.1063/1.91651
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