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Annealing of damage and redistribution of Cr in boron‐implanted Si3N4‐capped GaAs
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10.1063/1.91734
/content/aip/journal/apl/37/5/10.1063/1.91734
http://aip.metastore.ingenta.com/content/aip/journal/apl/37/5/10.1063/1.91734
/content/aip/journal/apl/37/5/10.1063/1.91734
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/content/aip/journal/apl/37/5/10.1063/1.91734
2008-07-23
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Annealing of damage and redistribution of Cr in boron‐implanted Si3N4‐capped GaAs
http://aip.metastore.ingenta.com/content/aip/journal/apl/37/5/10.1063/1.91734
10.1063/1.91734
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