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Thermal oxidation of hafnium silicide films on silicon
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10.1063/1.92005
/content/aip/journal/apl/37/7/10.1063/1.92005
http://aip.metastore.ingenta.com/content/aip/journal/apl/37/7/10.1063/1.92005
/content/aip/journal/apl/37/7/10.1063/1.92005
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/content/aip/journal/apl/37/7/10.1063/1.92005
2008-07-23
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thermal oxidation of hafnium silicide films on silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/37/7/10.1063/1.92005
10.1063/1.92005
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