Full text loading...
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Formation of silicon nitride structures by direct electron beam writing
1.For a general review of silicon nitride, see C.‐E. Morosanu, Thin Solid Films 65, 171 (1980).
2.T. Sakurai and H. D. Hagstrum, Phys. Rev. B 14, 1593 (1976).
3.Silicon surface structures have been reviewed by D. E. Eastman, J. Vac. Sci. Technol. 17, 492 (1980);
3.see also M. J. Cardillo and G. E. Becker, Phys. Rev. B 21, 1497 (1980).
4.R. Hezel and N. Lieske, J. Appl. Phys. 51, 2566 (1980).
5.J. F. Delord, A. G. Schrott, and S. C. Fain, Jr., J. Vac. Sci. Technol. 17, 517 (1980).
Article metrics loading...