Sub‐20‐nm‐wide metal lines by electron‐beam exposure of thin poly(methyl methacrylate) films and liftoff
1.A. N. Broers, W. Molzen, J. Cuomo, and N. Wittels, Appl. Phys. Lett. 29, 596 (1976).
2.A. N. Broers, J. M. E. Harper, and W. W. Molzen, Appl. Phys. Lett. 33, 392 (1978).
3.D. E. Bradley, J. Appl. Phys. 5, 65 (1954).
4.S. P. Beaumont, T. Tamamura, and C. D. W. Wilkinson, Proceedings of the Nineth International Conference on Electron and Ion Beam Science Technology, edited by R. Bakish (Electrochemical Society, Princeton, to be published).
5.W. R. K. Clark, J. N. Chapman, R. P. Ferrier, S. P. Beaumont, T. Tamaura, and C. D. W. Wilkinson, presented at the seventh European Congress on Electron Microscopy, The Hague, Netherlands, August 1980 (unpublished).
6.R. Shimizu, Y. Kataoka, T. Matsukawa, T. Ikuta, K. Murata, and H. Hashimoto, J. Phys. D 8, 820 (1975).
7.R. E. Jewett, P. I. Hagouel, A. R. Neureuther, and T. van Duzer, Polym. Eng. Sci. 17, 381 (1977).
8.J. S. Greeneich, J. Electrochem. Soc. 122, 970 (1975).
9.R. Feder, E. Spiller, J. Topalian, and M. Hatzakis, Proceedings of the Seventh International Electron and Ion Beam Science Technology Conference (Electrochemical Society, 1976).
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Article metrics loading...
Full text loading...
Most read this month
Most cited this month