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Sub‐20‐nm‐wide metal lines by electron‐beam exposure of thin poly(methyl methacrylate) films and liftoff
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10.1063/1.92388
/content/aip/journal/apl/38/6/10.1063/1.92388
http://aip.metastore.ingenta.com/content/aip/journal/apl/38/6/10.1063/1.92388
/content/aip/journal/apl/38/6/10.1063/1.92388
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/content/aip/journal/apl/38/6/10.1063/1.92388
1981-03-15
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sub‐20‐nm‐wide metal lines by electron‐beam exposure of thin poly(methyl methacrylate) films and liftoff
http://aip.metastore.ingenta.com/content/aip/journal/apl/38/6/10.1063/1.92388
10.1063/1.92388
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