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Laser photochemical microalloying for etching of aluminum thin films
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2.D. S. Lashmore, Plating and Surface Finishing 65, 44 (1978).
3.See e.g. Aluminum, Vol. 1, edited by K. R. Van Horn, (American Society for Metals, Metals Park, Ohio, 1967).
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6.T. O. Herndon and J. F. Howard, An Improved System for Aluminum Etching with in technical program Semicon/East, Boston, 1980 (unpublished).
7.Comprehensive Chemical Kinetics, Vol. 4, edited by C. H. Bamford and C. F. H. Tipper, (Elsevier, Amsterdam, 1972) p. 290–214.
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9.M. Hansen, Constitution of Binary Alloys, (McGraw‐Hill, New York, 1958).
10.D. J. Ehrlich, R. M. Osgood, Jr., and T. F. Deutsch, QE‐16, 1233 (1980).
11.See D. Gupta, D. R. Cambell, and P. S. Ho in Thin Films‐Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. W. Mayer, (Wiley, New York, 1978).
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14.We have found that a 514.5‐nm beam can promote rapid attack via reactions in dilute HCl.
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