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Influence of cw laser scan speed in solid‐phase crystallization of amorphous Si film on Si3N4/glass substrate
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10.1063/1.92452
/content/aip/journal/apl/38/8/10.1063/1.92452
http://aip.metastore.ingenta.com/content/aip/journal/apl/38/8/10.1063/1.92452
/content/aip/journal/apl/38/8/10.1063/1.92452
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/content/aip/journal/apl/38/8/10.1063/1.92452
1981-04-15
2014-12-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of cw laser scan speed in solid‐phase crystallization of amorphous Si film on Si3N4/glass substrate
http://aip.metastore.ingenta.com/content/aip/journal/apl/38/8/10.1063/1.92452
10.1063/1.92452
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