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Kinetics and mechanism of amorphous hydrogenated silicon growth by homogeneous chemical vapor deposition
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10.1063/1.92521
/content/aip/journal/apl/39/1/10.1063/1.92521
http://aip.metastore.ingenta.com/content/aip/journal/apl/39/1/10.1063/1.92521
/content/aip/journal/apl/39/1/10.1063/1.92521
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/content/aip/journal/apl/39/1/10.1063/1.92521
1981-07-01
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Kinetics and mechanism of amorphous hydrogenated silicon growth by homogeneous chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/39/1/10.1063/1.92521
10.1063/1.92521
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