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Electrochemical diffusion of arsenic in silicon through thermal thin SiO2 films
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10.1063/1.93169
/content/aip/journal/apl/40/7/10.1063/1.93169
http://aip.metastore.ingenta.com/content/aip/journal/apl/40/7/10.1063/1.93169
/content/aip/journal/apl/40/7/10.1063/1.93169
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/content/aip/journal/apl/40/7/10.1063/1.93169
1982-04-01
2014-10-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrochemical diffusion of arsenic in silicon through thermal thin SiO2 films
http://aip.metastore.ingenta.com/content/aip/journal/apl/40/7/10.1063/1.93169
10.1063/1.93169
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