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Analysis of arsenic and phosphorus ion implanted silicon by spectroscopic ellipsometry
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10.1063/1.93301
/content/aip/journal/apl/41/1/10.1063/1.93301
http://aip.metastore.ingenta.com/content/aip/journal/apl/41/1/10.1063/1.93301
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/content/aip/journal/apl/41/1/10.1063/1.93301
1982-07-01
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Analysis of arsenic and phosphorus ion implanted silicon by spectroscopic ellipsometry
http://aip.metastore.ingenta.com/content/aip/journal/apl/41/1/10.1063/1.93301
10.1063/1.93301
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